Pulsed Laser Deposition System
- Lambda Physik Compex KrF excimer laser (λ = 248 nm).
Four-point Probe Station with Heating Stage
- Hot chuck heated up to 300 °C with a water chiller system
Keithley 4200A-SCS Semiconductor Analyzer
- ± 210V DC I-V (resolution: 100 fA)
- 1 kHz- 10 MHz AC Impedance, C-V, C-f, C-t (resolution: 1 kHz, 1 aF, 1 nS)
- ± 40V Pulsed I-V (60 ns PW source/measure)
Radiant Multiferroic II Ferroelectric Tester
- Range: 270 kHz at ±100V
- Polarization measurement under AC & DC Fields
Grinding/Polishing machine
- Designed for manual TEM sample preperation
- 10-500 RPM
1200 °C Compact Tube Furnace
- 8-inch heating zone with vacuum flanges
- 60mm diameter tube
Vacuum Oven
40T Hydraulic Press
Optical Microscope
High Precision Balance
Digital Stirring Hot Plate
Vacuum Sealer
Ultrasonic Cleaner
Desiccators